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压电响应力显微术（PFM）是一种原子力显微技术，可用于表征许多材料体系功能的机电耦合特性，包括：压电体、铁电体，以及某些生物材料。通过原子力显微镜的探针针尖，对样品进行局部的电刺激，同时测量其~1-100pm / V量级的机械响应。该技术与基础材料研究和应用技术的多个领域有关。在商用PFM技术领域，Asylum Research是公认的优质品牌，因为我们的产品具备各种先进的、有专利权的测量技术和功能，可提供无串扰、高灵敏度的PFM测量。
Now with the Interferometric Displacement Sensor (IDS) Option for the Cypher AFM, d33 measurements are more reproducible and artifact-free. Interferometric detection directly measures cantilever deflection instead of cantilever angle that is utilized in conventional optical beam detection (OBD). IDS eliminates the artifacts due to electrostatic coupling. Learn how IDS improves PFM measurements by downloading the white paper below.
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"Higher-eigenmode piezoresponse force microscopy: a path towards increased sensitivity and the elimination of electrostatic artifacts," G. A. MacDonald, F. W. DelRio, and J. P. Killgore, Nano Futures 2, 015005 (2018). https://doi.org/10.1088/2399-1984/aab2bc
"Domain-wall conduction in ferroelectric BiFeO3 controlled by accumulation of charged defects," T. Rojac, A. Bencan, G. Drazic, N. Sakamoto, H. Ursic, B. Jancar, G. Tavcar, M. Makarovic, J. Walker, B. Malic, and D. Damjanovic, Nat. Mater. 16, 322 (2017). https://doi.org/10.1038/nmat4799
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